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Equipment
1. Reactive Magnetron Sputtering: B901
2. Cathodic Arc Evaporation: URM 079
3. Reactive Magnetron Sputtering: SP2000
4. Reactive Magnetron Sputtering: Maciapunga:)
5. Diffusion Treatments: Vacuum Furnaces
6. Thermogravimetry: Furnace with Microbalance
7. High Temperature Tribometer
8. Basic Investigation Equipment
1. Reactive Magnetron Sputtering: B901

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Sample holder
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Rotary, with one degree of freedom
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Residual pressure
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10-4 Pa
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Chamber equipment
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4 independent magnetron sputtering sources (max. power 10 kW each)
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Gas supply
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Inert
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Ar
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Reactive
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N2, C2H2, O2, CH4
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Sample cleaning method
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Glow discharge under reduced pressure in Ar atmosphere
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Sample bias
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0 - 400V
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Other
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Specimen heating up to 473K
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2. Cathodic Arc Evaporation: URM 079

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Sample holder
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Rotary, with two degrees of freedom (60 independent axis for samples)
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Residual pressure
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10-4 Pa
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Chamber equipment
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2 continuous arc sources of metal plasma (arc current up to 180 A)
2 pulsed arc sources of carbon plasma (mean power of the carbon arc discharge 1 kW)
1 magnetron sputtering source (max. power 10 kW)
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Gas supply
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Inert
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Ar
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Reactive
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N2, C2H2, O2, CH4
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Sample cleaning method
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4 Ar ion beams (max. Ar ion energy - 4keV each, without specimen bias)
Me ions from arc evaporators
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Sample bias
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High: 800 - 2500V
Low: 0 - 200V
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Other
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Specimen heating up to 723K
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3. Reactive Magnetron Sputtering: SP2000

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Residual pressure
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10-4 Pa
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Chamber equipment
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4 linear magnetron sputtering sources (max. power 15 kW)
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Gas supply
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Inert
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Ar
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Reactive
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N2, C2H2, O2, CH4
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Sample cleaning method
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Glow discharge under reduced pressure in Ar atmosphere
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Sample bias
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0 - 400V
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4. Reactive Magnetron Sputtering for powders: Maciapunga:)

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Sample holders
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1. Rotary, with one degree of freedom
2. Specialised rotary holder for powders or particles to coat
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Residual pressure
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10-4 Pa
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Chamber equipment
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4 independent magnetron sputtering sources (max. power density - 50W/cm2)
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Gas supply
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Inert
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Ar
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Reactive
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N2, C2H2, O2, CH4, H2
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Sample cleaning method
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Glow discharge under reduced pressure in Ar atmosphere
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Sample bias
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0 - 600V
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Other
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Specimens heating up to 773K
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5. Diffusion Treatments: Vacuum Furnaces

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Quartz tube inner diameter
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80 mm or 110 mm
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Residual pressure
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10-3 Pa
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Max. temperature
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1473K
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Gas supply
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Inert
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Ar
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Reactive
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N2, C2H2, O2, CH4
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Additional equipment
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Glow discharge supply for plasma treatment of specimen surface
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6. Thermogravimetry: Furnace with Balance

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Balance precision
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10-5 g
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Maximum operating temperature
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1473K
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Maximum specimen dimensions
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up to 13mmx13mm
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Other
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Continuous aquisition by PC
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7. CSM High Temperature Tribometer

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Contact pair type
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Pin-on-disc, ball-on-disc
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| Minimum load force |
1N |
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Maximum load force
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60N |
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Maximum samples dimensions
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Diameter up to 55mm (typically 25,4mm)
Height: up to 10mm (typically 6mm)
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Maximum temperature of friction tests
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1000°C
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| Diameter of ball |
up to 7mm (typically 1/4'' or 1/8'') |
| Available balls' materials |
Si3N4, WC, Al2O3, ZrO2, 100Cr6 steel |
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Other
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Tribological tests can be performed in liquid up to 300°C
Controlled and regulated relative humidity
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8. Basic Invesigation Equipment
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Olimpus Optical Microscope
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Calotester
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Interference Microscope
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